Sputtering Targets
Metals: Al, C, Cr, Cu, Ge, Co, Au, Hf, In, Fe, Pd, Mg, Mo, Ni, Nb, Pt
Oxides: Al2O3, CeO2, Cr2O3, CuO, Ga2O3, GeO2, In2O3, La2O3
To: Hind High Vacuum Company Private Limited
Hind High Vacuum Company Private Limited
Hind High Vacuum Company Private Limited
Thin Films Division, Site No. 17, Phase 1, Peenya,
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